Estimate of tungsten thin films thermal conductivity from electrical measurements using Wiedemann-Franz Law
Keywords:
Tungsten thin films; RF magnetron sputtering; electrical conductivity; thermal conductivity; Wiedemann-Franz law, Tungsten thin films, RF magnetron sputtering, electrical conductivity, thermal conductivity, Wiedemann-Franz law
Abstract
Tungsten thin films were grown on glass substrates by RF sputtering using argon pressures from 5 to 35 mTorr. The electrical properties for all samples were measured using a Hall system, the values obtained for carrier concentration are around 1022 holes/cm3. Changes in the electrical conductivity were correlated with the transport mechanism of the sputtered W in the background Ar gas. With the measured electrical conductivity was possible to calculate the thermal conductivity using the Wiedemann-Franz law. The calculated thermal conductivities were in a good agreement with previous experimental reports in the literature, suggesting that W thin films grown in low argon pressures have potential applications as metallic thin films in multilayers absorber of solar collectors.
References
Bonello, B., Perrin, B., & Rossignol, C. (1998). Photothermal properties of bulk and layered materials by the picosecond acoustics technique acoustics technique. Journal of Applied Physics, 83(May). https://doi.org/10.1063/1.367064
Dan, A., Chattopadhyay, K., Barshilia, H. C., & Basu, B. (2016). Angular solar absorptance and thermal stability of W / WAlN / WAlON / Al 2 O 3 -based solar selective absorber coating. Applied Thermal Engineering, 109, 997–1002. https://doi.org/10.1016/j.applthermaleng.2016.04.069
Hao, Q., Chen, W., & Xiao, G. (2015). Beta (β) tungsten thin films: Structure, electron transport, and giant spin Hall effect. Applied Physics Letters, 106(18), 182403.
Hostetler, J. L., Sm, A. N., & Norris, P. M. (1997). THIN-FILM THERMAL CONDUCTIVITY AND THICKNESS MEASUREMENTS USING PICOSECOND ULTRASONICS.
Hurd, C. (1972). The Hall effect in metals and alloys. Springer Science & Business Media.
Jin, Y., Kang, S., Oh, Y., Won, G., Ho, I., Nam, H., & Keun, Y. (2018). Materials Characterization Microstructural evolution and electrical resistivity of nanocrystalline W thin fi lms grown by sputtering. Materials Characterization, 145(July), 473–478. https://doi.org/10.1016/j.matchar.2018.09.016
Metz, W. A., Mahan, J. E., Malhotra, V., & Martin, T. L. (1984). Electrical properties of selectively deposited tungsten thin films. Applied Physics Letters, 44(12), 1139–1141.
Narasimham, A. J., Medikonda, M., Matsubayashi, A., Khare, P., Chong, H., Matyi, R. J., … LaBella, V. P. (2014). Fabrication of 5-20 nm thick β-W films. AIP Advances, 4(11), 117139.
Richardson, C. J. K., & Spicer, J. B. (2003). Characterization of heat-treated tungsten thin films using picosecond duration thermoelastic transients. Optics and Lasers in Engineering, 40, 379–391.
Rossnagel, S. M., Yang, I., & Cuomo, J. J. (1991). Compositional changes during magnetron sputtering of alloys. Thin Solid Films, 199(1), 59–69.
Somekh, R. E. (2014). The thermalization of energetic atoms during the sputtering process The thermalization of energetic atoms during the sputtering process. Vacuum Science & Technology, 1285(1984). https://doi.org/10.1116/1.572396
Vijaya, G., M, M. S., Krupashankara, M. S., Srinivas, M. R., & Kulkarni, R. S. (2018). ScienceDirect Development and Analysis of Tungsten Thin film Coating for Solar Absorption. Materials Today: Proceedings, 5(1), 2555–2563. https://doi.org/10.1016/j.matpr.2017.11.039
Wiedemann, R. F. G. (1853). Ueber die Wärme‐Leitungsfähigkeit der Metalle. Annalen Der Physik.
Dan, A., Chattopadhyay, K., Barshilia, H. C., & Basu, B. (2016). Angular solar absorptance and thermal stability of W / WAlN / WAlON / Al 2 O 3 -based solar selective absorber coating. Applied Thermal Engineering, 109, 997–1002. https://doi.org/10.1016/j.applthermaleng.2016.04.069
Hao, Q., Chen, W., & Xiao, G. (2015). Beta (β) tungsten thin films: Structure, electron transport, and giant spin Hall effect. Applied Physics Letters, 106(18), 182403.
Hostetler, J. L., Sm, A. N., & Norris, P. M. (1997). THIN-FILM THERMAL CONDUCTIVITY AND THICKNESS MEASUREMENTS USING PICOSECOND ULTRASONICS.
Hurd, C. (1972). The Hall effect in metals and alloys. Springer Science & Business Media.
Jin, Y., Kang, S., Oh, Y., Won, G., Ho, I., Nam, H., & Keun, Y. (2018). Materials Characterization Microstructural evolution and electrical resistivity of nanocrystalline W thin fi lms grown by sputtering. Materials Characterization, 145(July), 473–478. https://doi.org/10.1016/j.matchar.2018.09.016
Metz, W. A., Mahan, J. E., Malhotra, V., & Martin, T. L. (1984). Electrical properties of selectively deposited tungsten thin films. Applied Physics Letters, 44(12), 1139–1141.
Narasimham, A. J., Medikonda, M., Matsubayashi, A., Khare, P., Chong, H., Matyi, R. J., … LaBella, V. P. (2014). Fabrication of 5-20 nm thick β-W films. AIP Advances, 4(11), 117139.
Richardson, C. J. K., & Spicer, J. B. (2003). Characterization of heat-treated tungsten thin films using picosecond duration thermoelastic transients. Optics and Lasers in Engineering, 40, 379–391.
Rossnagel, S. M., Yang, I., & Cuomo, J. J. (1991). Compositional changes during magnetron sputtering of alloys. Thin Solid Films, 199(1), 59–69.
Somekh, R. E. (2014). The thermalization of energetic atoms during the sputtering process The thermalization of energetic atoms during the sputtering process. Vacuum Science & Technology, 1285(1984). https://doi.org/10.1116/1.572396
Vijaya, G., M, M. S., Krupashankara, M. S., Srinivas, M. R., & Kulkarni, R. S. (2018). ScienceDirect Development and Analysis of Tungsten Thin film Coating for Solar Absorption. Materials Today: Proceedings, 5(1), 2555–2563. https://doi.org/10.1016/j.matpr.2017.11.039
Wiedemann, R. F. G. (1853). Ueber die Wärme‐Leitungsfähigkeit der Metalle. Annalen Der Physik.
Published
2019-09-10
Section
Artículos de Investigación
This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.
Avisos de derechos de autor propuestos por Creative Commons
1. Política propuesta para revistas que ofrecen acceso abierto
Aquellos autores/as que tengan publicaciones con esta revista, aceptan los términos siguientes:
- Los autores/as conservarán sus derechos de autor y garantizarán a la revista el derecho de primera publicación de su obra, el cuál estará simultáneamente sujeto a la Licencia de reconocimiento de Creative Commons que permite a terceros compartir la obra siempre que se indique su autor y su primera publicación esta revista.
- Los autores/as podrán adoptar otros acuerdos de licencia no exclusiva de distribución de la versión de la obra publicada (p. ej.: depositarla en un archivo telemático institucional o publicarla en un volumen monográfico) siempre que se indique la publicación inicial en esta revista.
- Se permite y recomienda a los autores/as difundir su obra a través de Internet (p. ej.: en archivos telemáticos institucionales o en su página web) antes y durante el proceso de envío, lo cual puede producir intercambios interesantes y aumentar las citas de la obra publicada. (Véase El efecto del acceso abierto).
